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  <front>
    <journal-meta />
    <article-meta>
      <title-group>
        <article-title>Overview of Health Monitoring Techniques for Reliability</article-title>
      </title-group>
      <contrib-group>
        <contrib contrib-type="author">
          <string-name>Abhijit Deb</string-name>
        </contrib>
        <contrib contrib-type="author">
          <string-name>Bart Vermeulen</string-name>
        </contrib>
        <contrib contrib-type="author">
          <string-name>Luc van Dijk</string-name>
        </contrib>
      </contrib-group>
      <abstract>
        <p>-Many semiconductor circuit wearout monitoring techniques have been developed for different applications. This paper presents an overview of the prominent wearout monitoring techniques. We systematically categorize the semiconductor wearout monitoring techniques and qualitatively assess the different categories for the health monitoring application.</p>
      </abstract>
      <kwd-group>
        <kwd>ISO26262</kwd>
        <kwd>reliability</kwd>
        <kwd>NBTI</kwd>
        <kwd>PBTI</kwd>
        <kwd>HCI</kwd>
        <kwd>wearout</kwd>
        <kwd>aging</kwd>
        <kwd>health monitoring</kwd>
      </kwd-group>
    </article-meta>
  </front>
  <body>
    <sec id="sec-1">
      <title>-</title>
      <p>The rest of the paper is organized as follows. Section II
briefly discusses the major wearout mechanisms. The most
prominent monitoring techniques are categorized and assessed
in Section III. The paper is concluded in Section IV.</p>
    </sec>
    <sec id="sec-2">
      <title>II. SEMICONDUCTOR WEAROUT</title>
      <sec id="sec-2-1">
        <title>A. Major wearout mechanisms</title>
        <p>The Negative Bias Temperature Instability (NBTI),
Positive Bias Temperature Instability (NBTI), Hot Carrier</p>
        <p>This work was partially funded by the European CATRENE RESIST
subsidy project.</p>
        <p>
          Injection (HCI), and Time-Dependent Dielectric Breakdown
(TDDB) are cited as major wearout mechanisms [
          <xref ref-type="bibr" rid="ref3">3</xref>
          ][
          <xref ref-type="bibr" rid="ref4">4</xref>
          ][
          <xref ref-type="bibr" rid="ref7">7</xref>
          ].
NBTI affects PMOS devices when the negative gate-source
bias voltage draws carriers from the channel into the gate
dielectric. This breaks the Si-H bonds at the silicon-oxide
interface and causes a positive shift in the absolute value of the
threshold voltage. The effect is more pronounced at higher
temperatures. PBTI affects the NMOS devices and causes a
threshold voltage shift due to the application of a positive bias
voltage. It becomes critical for devices fabricated in newer
process technologies that employ high-K dielectric materials
[
          <xref ref-type="bibr" rid="ref7">7</xref>
          ]. HCI takes place as transistors switch and some carriers
gain a high kinetic energy. These so-called hot carriers may be
injected into the gate oxide and get trapped there. Hence the
device degrades by way of a degrading threshold voltage and
saturation current [
          <xref ref-type="bibr" rid="ref7">7</xref>
          ]. TDDB is becoming an increasing
concern as the gate dielectric thickness is scaled down to the
nanometer range [
          <xref ref-type="bibr" rid="ref4">4</xref>
          ]. Since the supply voltage is not scaled as
aggressively as the device dimensions, a stronger electric field
is formed across the gate oxide. This degrades the dielectric
material and causes a conductive path through the gate
dielectric layer.
        </p>
        <p>B. Causes of Wearout
•
•
•
•
•
•</p>
      </sec>
    </sec>
    <sec id="sec-3">
      <title>The following factors are known to cause wearout.</title>
      <p>Newer technology: Process scaling and high-K dielectric
materials contribute to PBTI and TDDB.</p>
    </sec>
    <sec id="sec-4">
      <title>Temperature: Temperature</title>
      <p>
        mechanisms, like NBTI.
influences
the
wearout
Thermal cycling: The thermal cycling contributes to the
degradation of devices composed of multiple materials,
such as a semiconductor IC [
        <xref ref-type="bibr" rid="ref1">1</xref>
        ].
      </p>
      <p>Supply voltage: Degradation depends on the supply voltage.
In particular, the dynamic voltage scaling technique
contributes to device degradation.</p>
      <p>
        Amount of workload: The capacitive load driven by a
circuit has a correlation with the degradation [
        <xref ref-type="bibr" rid="ref15">15</xref>
        ][
        <xref ref-type="bibr" rid="ref16">16</xref>
        ].
Switching activity: More switching leads to an increase of
hot carriers, which accelerates the HCI.
      </p>
      <sec id="sec-4-1">
        <title>C. Indicators of Wearout</title>
        <p>Semiconductor wearout is a gradual process, which creates
a chain of degradation events. It starts with the degradation of
the threshold voltage as shown in Fig. 1. The threshold voltage
degradation leads to a reduction of the drain current. As a
result, signals take more time to travel through the datapath.
This is indicated as the increasing circuit delay in Fig. 1.</p>
        <p>A slight increase in the propagation delay may not
immediately create a timing failure. It merely reduces the
available timing margin of the datapath. At this point the circuit
is still capable of functioning correctly albeit with a diminished
timing margin. With the increase in stress conditions or
continued aging, the timing margin diminishes to a point where
a timing failure starts to occur. The degraded circuit may still
function correctly at a slower clock speed and/or with relaxed
operating conditions. However, a timing failure will occur at
the normal operating conditions. As the aging process
continues, the device eventually breaks down. At this point the
circuit is not capable of functioning any longer. Different
monitoring techniques to detect these indicators are discussed
in the following section.</p>
      </sec>
    </sec>
    <sec id="sec-5">
      <title>III. WEAROUT MONITORING TECHNIQUES</title>
      <p>We first categorize the monitoring techniques based on
where the function is implemented. We then categorize them
further based on how the function is implemented. This
categorization is shown in Fig. 2. The techniques highlighted in
gray are discussed separately in the following sub-sections.</p>
      <p>
        This technique applies different types of stress factors to
the target die for a period of time, removes the stress, and
performs an I–V measurement using external equipment. The
stress factors include temperature, voltage, thermal cycling,
and mechanical stress [
        <xref ref-type="bibr" rid="ref1">1</xref>
        ]. The conceptual diagram of the
offchip monitoring is shown in Fig. 3. It is typically performed for
process characterization and design optimization applications.
      </p>
      <p>This technique allows the extraction and analysis of a large
set of measurement data on powerful computing platforms.
However, it relies on external measurement equipment, which
is not suitable for run-time health monitoring application. To
comply with the highest safety levels defined in the ISO26262,
monitors need to be implemented independent from the circuit
being monitored. This is to avoid a failure common to both the
circuit being monitored and the monitor. Such common cause
failures may result in an undetected error. Off chip monitors
are well suited to avoid a common cause failure and can be an
attractive way to abide by the ISO26262 recommendations.
However, for run-time health monitoring purposes the off-chip
solution needs to avoid relying on external equipment.</p>
      <sec id="sec-5-1">
        <title>B. Off-datapath monitoring using dedicated circuitry</title>
        <p>The on-chip monitoring technique can be realized in two
different ways. The monitoring function can observe a circuit
under stress that is not part of the datapath; or it can monitor
the datapath itself. The former is called off-datapath monitoring
and the latter is called on-datapath monitoring. The conceptual
diagram of off-datapath monitoring is shown in Fig. 4. The
analysis of the monitor observations may or may not take place
on-chip, hence the dotted line around the analysis block.</p>
        <p>
          The circuit under stress used in off-datapath monitoring can
be constructed by means of a dedicated circuit, or a modified
version of the datapath. This section discusses the off-datapath
monitoring by a dedicated circuit, e.g., a ring oscillator. A
stress voltage is applied to stress the ring oscillator and the
difference of its oscillator period before and after the stress is
used to measure the performance degradation due to NBTI [
          <xref ref-type="bibr" rid="ref2">2</xref>
          ].
This technique, however, cannot eliminate the common mode
environmental variation effects and cannot determine which
portion of the frequency degradation is due to NBTI, and
which portion is due to environmental variations. To overcome
this limitation, a differential frequency measurement technique
is presented in [
          <xref ref-type="bibr" rid="ref3">3</xref>
          ]. They employ a pair of ring oscillators, out
of which one is stressed and the other is not. Karl et al. rely on
a PMOS device that controls the current supplied to a ring
oscillator [
          <xref ref-type="bibr" rid="ref5">5</xref>
          ]. The NBTI effect degrades the threshold voltage
of the PMOS device, causing the current to the ring oscillator
to decrease. As a result, its oscillation frequency reduces.
        </p>
        <p>
          TDDB causes the formation of a conductive path in the gate
dielectric layer. The circuit in [
          <xref ref-type="bibr" rid="ref4">4</xref>
          ] monitors a progressive
decrease in the gate resistance, which is indicative of TDDB.
        </p>
        <p>
          There are monitors that can detect multiple wearout
mechanisms. The authors in [
          <xref ref-type="bibr" rid="ref6">6</xref>
          ] have presented an on-chip
aging sensor to monitor NBTI and HCI related degradation.
Their technique is based on measuring the threshold voltage
difference between an NBTI/HCI stressed device and an
NBTI/HCI unstressed device using an inverter chain. Keane et
al. have presented an all-in-one on-chip solution to monitor the
aging effects due to BTI, HCI, and TDDB [
          <xref ref-type="bibr" rid="ref7">7</xref>
          ]. Their solution
extends on work presented in [
          <xref ref-type="bibr" rid="ref3">3</xref>
          ], and the technique is capable
of separately monitoring the effects due to these three crucial
degradation mechanisms.
        </p>
        <p>This technique is suitable for process characterization and
design optimization. However, there are two major problems
related to the health monitoring application:
1. It is difficult to match the stress applied to the dedicated
circuit to the stress experienced by the datapath.
2. Even if realistic stress is applied to the dedicated circuit, it
is difficult to extrapolate the results to assess the actual
degradation of the functional datapath.</p>
      </sec>
      <sec id="sec-5-2">
        <title>C. Off-datapath monitoring using canary circuit</title>
        <p>
          Instead of a dedicated circuit, the circuit under stress can be
realized using a replica datapath. The replicated path, known as
the canary circuit, is designed such that it degrades faster than
the actual datapath. For example, the Vth degradation can be
induced by changing the body bias, oxide thickness variation,
and different W/L ratio. We can replicate a few timing-critical
paths and monitor their aging [
          <xref ref-type="bibr" rid="ref8">8</xref>
          ]. Based on the observed
degradation of the replicated critical paths, it is possible to
assess the health of the actual datapath. Three major limitations
of this technique are:
1. Aging depends on the field usage. Therefore, a path that
was non-critical after fabrication may become critical over
the lifetime due to its operating point, workload, and its
process corner [
          <xref ref-type="bibr" rid="ref15">15</xref>
          ][
          <xref ref-type="bibr" rid="ref16">16</xref>
          ][
          <xref ref-type="bibr" rid="ref17">17</xref>
          ]. Hence we may need to
construct a large number of replicas to include the paths
that are likely to become critical over the lifetime.
2. The replica and the actual datapath may degrade differently
due to on-die process variations and on-chip temperature
variations.
3. It is difficult to match the workload of the replica path to
the workload of the actual datapath.
        </p>
      </sec>
      <sec id="sec-5-3">
        <title>D. On-datapath offline monitoring</title>
        <p>On-datapath monitoring addresses the limitations of
offdatapath monitoring by observing the datapath itself. Based on
when the datapath is observed, this technique is divided into
off-line monitoring and on-line monitoring. The conceptual
diagram of on-datapath offline monitoring is shown in Fig. 5.</p>
        <p>
          Here, the datapath is monitored when it is not in the
functional mode. The datapath is excited by test patterns and
the test response is collected to analyze if any failure has
occurred. Structural tests for automotive In-Vehicle Network
(IVN) components have been presented in [
          <xref ref-type="bibr" rid="ref9">9</xref>
          ][
          <xref ref-type="bibr" rid="ref10">10</xref>
          ]. They are
able to diagnose stuck-at faults or wired-and faults. Based on
the test speed, this technique can be divided into two classes.
1. Normal offline monitoring: Test patterns are applied at the
test speed, which is typically lower than the functional
speed. Therefore, it can detect a breakdown situation.
However, it cannot detect the timing failure that occurs
when the circuit runs at the functional speed.
2. At-speed offline monitoring: Test patterns are applied at the
functional speed. This technique can detect the timing
failures caused by an increasing circuit delay.
        </p>
        <p>Here we observe the degradation of the datapath itself, and
thereby avoid the inaccuracy caused by the extrapolation
needed for the off-datapath monitoring technique. Since this
technique provides a pass/fail result, it is limited to diagnosis
purposes. It cannot make a prognosis of an imminent failure.</p>
      </sec>
      <sec id="sec-5-4">
        <title>E. On-datapath coarse grained online monitoring</title>
        <p>Online monitoring observes the datapath when it is in the
functional mode and exercised by functional input signals. The
conceptual diagram is shown in Fig. 6. The online monitoring
technique observes the slack of the datapath considering its
actual workload and on-chip effect. As the datapath degrades
with aging, the slack of the datapath between registers
gradually diminishes. Based on the resolution of the online
slack monitoring, this technique can be sub-divided into two
categories, namely, coarse-grained online monitoring and
finegrained online monitoring.</p>
        <p>
          For coarse grained monitoring, the slack is monitored to
yield a pass/fail indication. Different datapath slack monitoring
techniques have been reported in literature [
          <xref ref-type="bibr" rid="ref11">11</xref>
          ][
          <xref ref-type="bibr" rid="ref12">12</xref>
          ][
          <xref ref-type="bibr" rid="ref13">13</xref>
          ]. A
Razor flip-flop augments a delay-critical flip-flop with a
shadow latch controlled by a delayed clock. By comparing the
values stored in the flip-flop and the shadow latch, an error
signal is generated. In case of an error, the value in the latch is
utilized. By letting the error happen and handling it, they
eliminate the need for the voltage margin that is otherwise
necessary for “always-correct” operation in traditional designs.
This technique is used to tune the voltage and clock frequency.
To avoid the delayed clock, Sato et al. use a canary flip-flop
that has an added delay on its data input [
          <xref ref-type="bibr" rid="ref13">13</xref>
          ]. Their canary
flipflop experiences a timing error before the main flip-flop does.
        </p>
        <p>This technique does not require a dedicated circuit to stress,
any stress signal, nor an extrapolation of observation. Since it
only provides a pass/fail indication, the monitor can tell us if
there is enough slack to meet the timing or not. In this way it
provides an indication of a timing failure, but does not provide
an indication of an imminent failure. As a result, it is suitable
for diagnosis purposes, but not for prognosis purposes.</p>
      </sec>
      <sec id="sec-5-5">
        <title>F. On-datapath fine grained online monitoring</title>
        <p>
          Fine grained datapath monitoring measures the slack with a
higher resolution to detect the gradual decrease of the available
slack and the diminishing timing margin. This technique can be
realized by the triple-latch monitoring technique, which is
developed to tune the clock speed [
          <xref ref-type="bibr" rid="ref14">14</xref>
          ]. This technique samples
the datapath three times with a small delay interval and
compares the three samples. This comparison is used to make
sure that the clock speed is tuned optimally and the correct
value is propagated to the next stage.
        </p>
        <p>
          The resolution of the slack monitoring can be improved by
using more than three samples. Drake et al. have presented two
versions of online slack monitoring [
          <xref ref-type="bibr" rid="ref15">15</xref>
          ][
          <xref ref-type="bibr" rid="ref16">16</xref>
          ]. In [
          <xref ref-type="bibr" rid="ref15">15</xref>
          ] they
describe a delay chain consisting of inverters. The delay chain
is connected to the endpoint of a datapath. When an edge enters
the chain, its position in the chain is captured with the rising
edge of a clock. They measure the slack by looking at how far
the signal edge has propagated into the delay chain. In [
          <xref ref-type="bibr" rid="ref16">16</xref>
          ],
they implement the delay chain using buffers, instead of
inverters. They use their technique to adjust the voltage or
frequency of a microprocessor to save energy during
lowtemperature and low-activity periods. Blome et al. describe a
chain of delay buffers to monitor propagation latency [
          <xref ref-type="bibr" rid="ref18">18</xref>
          ].
With the arrival of the clock, some registers will capture the
correct value, while the others will store an incorrect value. An
XOR operation of each of the delayed registers with the correct
value produces a bit vector that shows the propagation delay.
        </p>
        <p>
          Agarwal et al. describe a circuit failure prediction concept,
which enables close to best-case design instead of traditional
worst-case design [
          <xref ref-type="bibr" rid="ref17">17</xref>
          ]. Their monitoring circuit is based on the
concept of stability checking during the guard-band interval by
detecting signal transitions too close to the capturing clock.
This is referred to as the guard-band violation. A guard-band
violation means that one or more paths have aged enough to
creep into the guard-band interval.
        </p>
        <p>The fine grained online monitoring technique observes the
diminishing timing margin of aging critical paths, considering
the effect of process variation, ambient conditions, and
workload. However, monitoring the large number of datapaths
of a typical design is not pragmatic. Therefore, monitors are
designed to observe a few aging critical datapaths. However,
aging depends on the field usage. Therefore, finding the aging
critical datapaths during the design-time is challenging.</p>
      </sec>
    </sec>
    <sec id="sec-6">
      <title>IV. CONCLUSION</title>
      <p>We categorize the available monitoring techniques and
qualitatively assess their value for health monitoring. We have
found that off-chip monitoring is “suitable by design” to
eliminate common cause failures and can help fulfill the
ISO26262 recommendations. However, their dependency on
external measurement equipment needs to be avoided.</p>
      <p>We find that the on-datapath techniques are particularly
suitable for health monitoring. They need to be implemented
independently from the circuit being monitored, for example
by means of independent power supply, oscillator, etc. The
following two techniques deserve further attention:
1. On-datapath offline monitoring becomes interesting when
at speed tests are conducted. Since it operates at the
functional speed, we can detect timing failures. Logic-BIST
circuits can be used to realize at-speed monitoring.
2. On-datapath fine grained online monitoring is an
interesting choice as it measures timing margins with
higher resolution. However, finding the aging critical paths
during the design-time remains a problem. Design-time
analysis of critical path delays are performed using library
cells whose delays are characterized for an output load and
input slew with respect to a given PVT corner. To find out
the path that would become critical during the lifetime of
the chip we need an aging-aware library whose cells are
characterized for load, slew and aging.</p>
    </sec>
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